No surface is perfectly flat. Even on highly polished surfaces, atomic step structures are present. Wafers are a typical example for such extremely flat surfaces. Obviously, it is impossible to cut, grind or polish an individual atom. Therefore, any deviation of the surface orientation from the atomic plane results in the formation of terraces on the surface, with atomic steps between them. The step edges are important for growth phenomena, like film formation, nucleation and epitaxy. The height of an atomic step depends on the atomic lattice of the material and also on the crystallographic plane that is parallel to the surface. Here we report on measurements of 12 atomic steps of silicon carbide with Tosca 400 AFM.